Advanced Lithography and the Semiconductor Industry Roadmap

Semiconductor devices are expected to continue their historic trend of diminishing size for at least several more device generations. Patterning at 65-, 45-, 32-nm and beyond is being enabled by new developments in optical lithography. “Conventional” 193-nm projection lithography will be replaced by liquid immersion lithography, double patterning processes, sophisticated mask design, and other technologies. Alternative lithographies, such as extreme ultraviolet (EUV) projection, electron-beam direct write, and nanoimprint, must compete with enhanced optical lithography in terms of cost, yield, and throughput. This talk will discuss the various aspects of sub-65 nm optical lithography, and place them in the broader context of the semiconductor industry roadmap. Topics will include prospects of high-index liquid immersion lithography, the applicability of double patterning, resist limitations, as well as new lithographic concepts. 

 Mordechai Rothschild

Mordechai Rothschild is Leader of the Submicrometer Technology Group at MIT Lincoln Laboratory. He has led a number of programs in lithography, microfabrication, and photochemistry, including the development of 193-nm optical lithography, which is the lithography used to fabricate most advanced semiconductor devices; and the development of liquid immersion lithography, which is expected to be the leading lithography in the next few years. He is a member of the U.S. Lithography Technical Working Group, which participates in formulating the International Technology Roadmap for Semiconductors (ITRS). He holds a B.S. degree in Physics from Bar-Ilan University, Israel, and a Ph.D. in Optics from the University of Rochester.

Reservations:

DINNER reservations are required by noon, January 12, 2009, the Monday of the meeting. MEETING ONLY reservations are required by noon, January 15, 2009, the day of the meeting. 

Please make reservations online. Reservations may also be left on the answering machine at 617.584.0266. We no longer have an email address for reservations due to SPAM. When making reservation requests, please provide the following information: 

• DINNER AND MEETING or meeting only
• Name(s) and membership status
• Daytime phone number where you can be reached (in case of change or cancellation)

Location:

Best Western TLC in Waltham (Map to TLC).

Networking—5:45 PM, Dinner—6:30, Meeting—7:30 PM.

Menu: 

Dinner will include --- and coffee, tea, or milk.

Vegetarian option available on request 

Dinner Prices:

General Information on NES/OSA Meetings

If the meeting must be canceled for any reason, we will try to call you at the phone number you leave with your reservation. Official notice of cancellation will be on our answering machine.

We have to pay for the dinners reserved as of the Tuesday before the meeting, so no-shows eat into our cash reserve. If you will not be able to attend, please let us know as early as possible. Otherwise, no-shows will be billed.

Membership Rates:

NOTE: The extra $5.00 of the non-member dinner fee can be used toward membership dues if the nonmember joins and pays dues for the current year at the meeting.